Hitachi Evactron E50 等离子清洗设备

产品介绍：

等离子体样品清洗设备Evaction E50主要用于场发射扫描电镜样品和样品室内碳氢化合物、有机物和表面碳污染的清洗。Evaction E50可以安装在电镜交换仓或样品室内，利用等离子体进行清洗，也可以用紫外线进行清洗，无需切换到低真空模式即可使用，射频功率高达50W，清洗效率高。

主要特点：

n  清洗效率高（射频功率50W）

n  等离子体和紫外线双重清洗

n  高真空模式下运行，真空范围大

n  无损清洗

n  无需特殊气源

n  兼容SEM、FIB等设备

The Evactron E50 Plasma De-contaminator was designed to remove hydrocarbon contamination from vacuum chambers such as SEMs, FIBs, TEMs, XPS and semiconductor equipment including CD-SEMs, ALD and EUVL. Its compact design fits all models of FIB/SEM chambers and loadlocks to provide in-situ sample cleaning. Evactron plasma cleaning shortens pumpdown time, maintains the ultimate vacuum level of your system and increases sample throughput with powerful yet thorough contamination removal.

EVACTRON E50 SYSTEM SPECIFICATIONS:

• Remote hollow cathode plasma radical source

• Desktop controller with pushbutton operation

• Android tablet with Bluetooth communication

• Library of tested recipes and options to change power, cycles, length of cleaning, etc.

• Chassis dimensions WxHxD: 17” x 3.4” x 6.7” (43 cm x 8.6 cm x 17 cm)

• RF Power: 35 – 75 Watts at 13.56 MHz RFHC

• 100-240 VAC 50/60 HZ input

• RoHS, CE, NRTL, TUV and SEMI S2 compliant