这款非接触式掩膜对准机mask aligner 能够适合6英寸,8英寸，12英寸晶圆掩膜对准，是欧洲进口的高精度紫外曝光机.
非接触式掩膜对准机mask aligner全面满足科学研究，工艺级生产等多领域的应用。完全采用非接触式100%标定系统，对晶圆和掩膜没有伤害，大大提高间隙精度
非接触式掩膜对准机mask aligner适合各种电子元器件，包括半导体，LED,LD,MEMS，传感器等。
| Alignment Scope | |
| Objectives separation | 15 ~ 75mm |
| Total magnification | 100X |
| Illuminator for observation | Red LED (l=633 nm) |
| X, Y Movement range of stage | ±5 mm |
| Adjustment | ±5° |
| Utility | |
| Power source for main body and mercury lamp | AC 100V 50/60Hz 15A |
| Vacuum source | Below 21.3 Kpa (-80 Kpa from atmospheric pressure) |
| Exposure Unit | |
| Lens | Integrator lens |
| Mercury lamp | 250W ultra-high pressure vapor mercury lamp |
| Effective exposure area | Max 100 mm |
| Intensity distribution | ±5% or less |
| Intensity of illumination | 20 mW/cm2 (405 nm) |
| Exposure time control | Digital timer and rotary solenoid |
| Mercury Lamp Lighting Unit | AC 110V |
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