R&D Cluster tools 研发用团簇

R&D Cluster tools 研发用团簇PECVD PVD

R&D Cluster tools

Cluster tool w/ 8 port locations

具有8个腔室的团簇型沉积系统

30x40cm substrate

衬底尺寸为30x40cm

Computer controlled

可完全由电脑程序控制操作运行

?PECVD, HWCVD and Sputter capability 制备方式包括等离子体和热丝化学气相沉积，及溅射。