详细介绍
纳米压印系统
EZImprinting introduces a bench-top, stand-alone nanoimprint platform.
This platform provides a mechanical stage with micro-positioning fixtures for mounting a nanoimprint chamber, UV-curing source, and alignment microscope.
It functions both as a nanoimprint system and as a traditional mask aligner while providing programmable, automatic control of your entire imprinting process.
EZImprinting Advantages
• Sub-10nm resolution with 99% yield
• Supports both hard and soft molds
• Variable mold and substrate sizes offer unparalleled convenience and flexibility
• Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint
• Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint
• Versatile processes for a wide variety of applications:
• optical devices, displays, data storage, biomedical
• devices, semiconductor IC's, chemical synthesis, and advanced materials
• Programmable PLC with touch-screen user interface allows process control through customized parameters
• Proprietary UV-curable nanoimprint resist has no limitations on hardness or thickness, and is compatible with traditional photolithography processes
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