Control of micro- and nanopatterns of octadecyltrimethoxysilane monolayers using nanoimprint lithography and atmospheric chemical vapor deposition

Octadecyltrimethoxysilane OTMS self-assembled monolayers have been grafted on micrometric
and nanometric areas of SiO2 /Si substrates using a process combining nanoimprint lithography and
atmospheric chemical vapor deposition. The optimization of the process has lead to monolayer
square patterns of OTMS with lateral sizes ranging from 2 m down to 50 nm. Their coverage
uniformity extends on several square millimeters. Their coverage density can be accurately tuned by
the deposition time. © 2007 American Vacuum Society. DOI: 10.1116/1.2402144